Aluminum Chromium Sputtering Target (AlCr) alloy 70:30/ 50:50 at%
After the development of sputtering coating technology in recent years, the coating technology for various materials has been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets) to colleges and universities, scientific research institutions, industrial and mining enterprises.
Application field of sputtering coating: Sputtering coating is widely used in packaging coating, decoration coating, architectural glass coating, automobile glass coating, low radiation glass coating, flat panel display, optical communication / optical industry, optical data storage industry, optical data storage industry, magnetic data storage industry, optical coating, semiconductor field, automation, solar energy, medical treatment, self lubrication film, capacitor Device coating, other functional coating, etc. (click to enter the detailed introduction)
Sputtering target backplane supply, bonding service: the center provides a variety of sputtering target backplane, including oxygen-free copper, molybdenum, aluminum, stainless steel and other materials. At the same time, it provides the welding service between the target and the back plate.
Aluminum Chromium Sputtering Target , Aluminum Chromium Alloy Sputtering Target are available in varying sizes
D100x40mm D65x35mm etc
| | Density(g/cm3) | Actual density(g/cm3) | Compactness density% |
| Cr30Al70at% 2N8 | 3.763 | 3.764 | >99% |
Sizes:
Plate sputtering targets:
Thickness: 0.04 to 1.40" (1.0 to 35mm).
Width up to 20"(50 to 500mm).
Length: 3.9" to 6.56 feet( 100-2000mm)
other sizes as requested.
Cylinder sputtering targets:
3.94 Dia. x 1.58"(100 Dia. x 40mm)
2.56 Dia. x 1.58" (65 Dia. x 40mm)
or 63*32mm other sizes as requested.
Tube sputtering targets:
2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)
3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)
other sizes as requested.
Based on the thermodynamic analysis of the vacuum sintering process of pure chromium target for magnetron sputtering, the necessary conditions for the sintering process were established and applied to the sintering practice. The sputtering target with oxygen content less than 0.07% was successfully achieved.
Cr-Al Alloy Target
CrAl Alloy Target
Product types:
Cr50% Al50% target Cr30% Al70% target
Application area
In the field of coating for tools such as carbide tools and heat treatment dies, the wear resistance of the coating and the service temperature of the coating can be improved
Target specification
Component
Cr Al Alloy Series: Cr50% Al50%; Cr30% Al70%; Cr25% Al75%
Cr-Al alloy series: Cr Al Si, Cr Al Ti, etc
grain size
< 70 μ m (μ m)
purity
≥99.9％(3N)
Impurity content
< 0.06 (%)
